The Role of Oxides in Reduction Reactions at the Metal-Water Interface

Engineering & Materials Science

• Oxides 100%
• Electrons 93%
• Metals 74%
• Water 63%
• Dehalogenation 47%
• Aliphatic compounds 43%
• Conduction bands 39%
• Semiconductor device models 39%
• Complexation 38%
• Ligands 31%
• Iron oxides 30%
• Oxidants 29%
• Oxide films 28%
• Iron 20%
• Semiconductor materials 20%
• Defects 15%

Chemical Compounds

• Solute 76%
• Oxide 62%
• Reduction 53%
• Electron Particle 37%
• Semiconductor 35%
• Aliphatic Compound 30%
• Dehalogenation 28%
• Conduction Band 25%
• Tunneling 23%
• Iron Oxide 21%
• Resonance 18%
• Electron Transfer 16%
• Surface 14%
• Metal 10%
• Ligand 10%