A Programmable DNA Double-Write Material: Synergy of Photolithography and Self-Assembly Nanofabrication

Youngjun Song; Tsukasa Takahashi; Sejung Kim; Yvonne C. Heaney; John Warner; Shaochen Chen; Michael J. Heller

doi:10.1021/acsami.6b11361

A Programmable DNA Double-Write Material: Synergy of Photolithography and Self-Assembly Nanofabrication

Youngjun Song, Tsukasa Takahashi, Sejung Kim, Yvonne C. Heaney, John Warner, Shaochen Chen, Michael J. Heller

Knight Cancer Institute

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

We demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences. The process requires no modification to the DNA by chemical reagents and allows programmed DNA self-assembly and further UV patterning in the UV exposed and nonexposed areas. Multilayered DNA patterning with hybridization of fluorescently labeled complementary DNA sequences, biotin probe/fluorescent streptavidin complexes, and DNA patterns with 500 nm line widths were all demonstrated.

Original language	English (US)
Pages (from-to)	22-28
Number of pages	7
Journal	ACS applied materials & interfaces
Volume	9
Issue number	1
DOIs	https://doi.org/10.1021/acsami.6b11361
State	Published - Jan 11 2017

Keywords

DNA
displacer effect
patterning
photolithography
self-assembly
thymine dimer

ASJC Scopus subject areas

Materials Science(all)

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10.1021/acsami.6b11361

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@article{88b33201fbd540dab1776c64600fd4ad,

title = "A Programmable DNA Double-Write Material: Synergy of Photolithography and Self-Assembly Nanofabrication",

abstract = "We demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences. The process requires no modification to the DNA by chemical reagents and allows programmed DNA self-assembly and further UV patterning in the UV exposed and nonexposed areas. Multilayered DNA patterning with hybridization of fluorescently labeled complementary DNA sequences, biotin probe/fluorescent streptavidin complexes, and DNA patterns with 500 nm line widths were all demonstrated.",

keywords = "DNA, displacer effect, patterning, photolithography, self-assembly, thymine dimer",

author = "Youngjun Song and Tsukasa Takahashi and Sejung Kim and Heaney, {Yvonne C.} and John Warner and Shaochen Chen and Heller, {Michael J.}",

year = "2017",

month = jan,

day = "11",

doi = "10.1021/acsami.6b11361",

language = "English (US)",

volume = "9",

pages = "22--28",

journal = "ACS applied materials & interfaces",

issn = "1944-8244",

publisher = "American Chemical Society",

number = "1",

}

TY - JOUR

T1 - A Programmable DNA Double-Write Material

T2 - Synergy of Photolithography and Self-Assembly Nanofabrication

AU - Song, Youngjun

AU - Takahashi, Tsukasa

AU - Kim, Sejung

AU - Heaney, Yvonne C.

AU - Warner, John

AU - Chen, Shaochen

AU - Heller, Michael J.

PY - 2017/1/11

Y1 - 2017/1/11

N2 - We demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences. The process requires no modification to the DNA by chemical reagents and allows programmed DNA self-assembly and further UV patterning in the UV exposed and nonexposed areas. Multilayered DNA patterning with hybridization of fluorescently labeled complementary DNA sequences, biotin probe/fluorescent streptavidin complexes, and DNA patterns with 500 nm line widths were all demonstrated.

AB - We demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences. The process requires no modification to the DNA by chemical reagents and allows programmed DNA self-assembly and further UV patterning in the UV exposed and nonexposed areas. Multilayered DNA patterning with hybridization of fluorescently labeled complementary DNA sequences, biotin probe/fluorescent streptavidin complexes, and DNA patterns with 500 nm line widths were all demonstrated.

KW - DNA

KW - displacer effect

KW - patterning

KW - photolithography

KW - self-assembly

KW - thymine dimer

UR - http://www.scopus.com/inward/record.url?scp=85037673424&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85037673424&partnerID=8YFLogxK

U2 - 10.1021/acsami.6b11361

DO - 10.1021/acsami.6b11361

M3 - Article

C2 - 28032747

AN - SCOPUS:85037673424

SN - 1944-8244

VL - 9

SP - 22

EP - 28

JO - ACS applied materials & interfaces

JF - ACS applied materials & interfaces

IS - 1

ER -

A Programmable DNA Double-Write Material: Synergy of Photolithography and Self-Assembly Nanofabrication

Abstract

Keywords

ASJC Scopus subject areas

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